Arc Evaporators
We offer a wide range of arc evaporators for R&D, lab, and industrial applications.
Our state-of-the-art arc evaporators allow evaporate metals, alloys, graphite to deposie Ti, TiN, Al, TiAlN, TiZrN, DLC and other hard, wear resistive, and decorative coatings for different applications. Typical circular arc evaporator AE04 used for metal, alloys, and compaunds coatings deposition, and power supply PSA200 have the following specifications (arc evaporator is shown on the picture below without external solenoids serving to focus and stabilize arc plasma flow):![]() |
Overall dimensions, mm | Ø335x300 |
| Evaporation rate, µm/s | 1 ... 4 | |
| Current, A | 40 ... 200 | |
| Voltage, V | 24 | |
| Open circuit voltage, V | 100 | |
| Power, kW, no more than | 8 | |
| Cathode Ø80x40 mm material to evaporate capacitance, kg | 2 ... 4 | |
| Ultimate pressure for ignition, Pa | 10-3 | |
| Ignition | Electronic, controlled |
| Type | IGBT invertor | ![]() |
| Overall dimensions, mm | 470x470x200 | |
| Current, A | 0 ... 200 | |
| Voltage, V | 24 | |
| Open circuit voltage, V | 100 | |
| Power, kW, no more than | 8 | |
| Efficiency, %, no less than | 90 | |
| Ignition | Internal electronic, controlled, frequency about 15 Hz | |
| Interface | RS232/485 |
For high quality coating deposition without drop phase the best choice is arc evaporator with plasma separation. The plasma of evaporated material is bent in a superposition of magnetic fields, and only ionized part of evaporated material reaches substrate to be coated. Neutral macro-particles, clasters, and material drops are not deflected in magnetic fields, move in straight direction and are trapped with shields or deposite on the chamber wall surfaces and, therefore, do not reach substrate.
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| Click on START to watch arc evaporation with plasma separation movie | Ti deposited in direct arc evaporation process (left) and with plasma separation (right) |
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Dual arc evaporator with plasma separation is used to increase process productivity and for alloys deposition - for instance, TiAl from separated Ti and Al cathodes, TiZr from separated Ti and Zr cathodes, etc. (on left). This method allows carefully control deposited alloy composition and obtain high quality coatings with repeatable properties. Dual arc evaporators also are used for DLC coating deposition (on right). |
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For R&D, lab, and industrial DLC coating manufacturing we also offer arc evaporator with laser ignition. See more detailed information about that and other technologies and equipment in our brochures (click):
or contact us directly.
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VECOR 101 Duranzo Aisle, Irvine, CA92606, USA
Phone: +1-949-394-4466, Fax: +1-949-451-6813, info@vecorus.com