Coating Machines

A wide range of cost effective coating machines for advanced R&D, lab and industrial applications. Lab and mass production of optical, wear-resistive, hard, decorative or other metal, dielectric, or semiconductor thin film single- and multi-layer coatings.

Available resistive and electron-beam evaporation, DC magnetron sputtering (balanced and unbalanced), arc evaporation icluding plasma separated, pulsed, and with laser plasma ignition.

All machines equipped with circular or linear ion beam source for substrates pre-cleaning and ion beam assisted deposition.

Stainless steel water cooled vacuum chambers. Pumping system with diffusion, turbomolecular, or cryo pump(s) on request.

Optical and/or quartz crystal process monitoring. Manual, semi-automatic, or fully automatic process control.

To see detailed machine specifications click on a picture.

Typical standard machines are presented here;
we also produce machines to meet detailed customer specifications.

VU2MI optical coating machine is intended for optical coatings R&D, lab and mass production (metal, semiconductors, and dielectric; single- and multilayer AR, mirrors, achromatic, filters, transparent electro-conductive, etc.) by e-beam and resistive evaporation with ion-beam assistance. The coating may be deposited on glass, metal, and plastic substrates. Turbomolecular pump (cryo or diffusion pumps as option) provide high vacuum pumping. The pumping and deposition runs are carried out in manual mode. The spectrophotometer (250-1100 nm) and quartz crystal monitor are used for the deposition run monitoring.

VU2MM - the same optical coating machine as VU2-MI but working in fully automated mode. Great for optical coatings mass production.

VU1100 "Optics" machine with vacuum chamber ø1100x1100 mm is intended for mass production of optical thin film coatings (metal, semiconductor, and dielectric; single- and multi-layer) by e-beam and resistive evaporation with ion-beam assistance. The pumping and deposition run are carried out in fully automatic mode. The spectrophotometer (250-1100 nm) and quartz crystal monitor are used for deposition run monitoring.

VU800MD - multipurposes coating machine with octagon chamber ø800x800 mm intended for hard, wear-resistive, decorative and other functional coatings deposition. The machine has 7 flanges Ø235 mm, 12 gas inputs, and may be equipped with a few arc evaporators, ion sources, and magnetrons (linear and circular) on customer request. Fully automated control mode available.

VU700DL coating machine is intended for DLC and other hard coating deposition by pulsed arc evaporation with laser ignition and plasma separation. It has cryo pumping system, two rotating cylindrical cathodes Ø140x300 mm providing a wide uniform deposition zone, substrate heater, biased planetary tooling. Allows deposit DLC coatings with deposition rate >1 µm/h and Ra<50 nm.

VU700DE coating machine has two dual arc evaporators with plasma separation - one for metal, alloy, and compaund coatings deposition and other for pulsed DLC coatings deposition. Machine also equipped with ion source for subdtrates pre-cleaning, activation, and ion beam assisted deposition, substrate heater, and biased planetary tooling.
VU"Roll-1600" machine is intended for polimer film (roll Ø400x1050 mm, film thickness 30 - 300 µm) one side metalization (Al). Uncoated stripes over the whole film length may be obtained. Al coating is deposited by resistive evaporation. Film feed speed is in the range of 1-10 m/s. Fully automated control.
VU1600 Series coating machines intended for mass production og single- and multilayer coatings. Substrates are located on horizontal rotating drum; coating is deposited with placed inside and outside of drum two linear resistive evaporators (machine VU1600ME), two linear arc evaporators (machine VU1600MA), or two linear DC magnetrons (machine VU1600MS). Special machine VU1600MMS is intended for multilayer optical coating deposition onto big components like 17" screens etc. It is equipped with 6 linear DC magnetrons and linear ion source, that may be used mainly for deposition TiO2, SiO2, ITO, Ag, and other materials. Optical monitor allows control and monitor deposition process in situ over the whole 380 nm - 780 nm range (or other on request). Linear anodic layer ion source is used for substrates ion beam pre-cleaning and ion beam assisted deposition.

VECOR 101 Duranzo Aisle, Irvine, CA92606, USA
Phone: +1-949-394-4466, Fax: +1-949-451-6813, info@vecorus.com