CONTROLLERS AND MONITORS

All systems are presented in standard configuration and may be manufactured in accordance with customer specifications. Move mouse on a picture to see a short model description. Click on a picture to open detailed specifications.


Provides manual and automatic pumping process control from atmosphere to high vacuum

Pumping controller VSC-3/1


 Provides stable gas flows and pressure in vacuum chamber for plasma and reactive processes. Up to four gas supply channels

Gas flow and pressure monitor GSC-4/1


 Aqousto-optical spectrophotometer for optical coatings deposition pocesses monitoring. Shows T/R spectra of deposited coating in-situ

Thin film deposition monitor and desk-top spectrophotometer AOS-4