High vacuum system for
hard, decorative, protective, wear-resistive,
antifriction and functional coating deposition by unbalanced magnetron
sputtering with ion-beam assistance. Intended for production of:
There is a wide selection
of metal, metal nitride, oxide, and oxinitride
coatings of different color and saturation as well as colorless without affecting
the workpiece color. The worcpieces (substrates) are placed on easy removable
carriers installed on the vertical drum rotating in vacuum chamber around the
linear ion-beam source, two heaters, and two unbalanced magnetrons. Ion beam
source is used both for workpieces ion-beam cleaning and for ion-beam assisted
deposition. The planetary rotating of installed workpieces is provided.SPECIFICATIONS
| Vacuum chamber dimensions, mm | Dia.730x760 |
| Drum diameter, mm | 500 |
| Rotating parts max. diameter, mm | 150 |
| Numbers of carriers per drum | 12 |
| Ultimate vacuum, torr | 2x10-5 |
| Number of ion sources | 1 |
| Ion source: - Voltage, V - Current, A |
2000 2 |
| Number of unbalanced magnetrons | 2 |
| Magnetron dimensions, mm | 650x150 |
| Magnetron max. power, kW | 40 |
| Number of infrared substrates heaters | 2 |
| Infrared heater power, kW | 6 |
| Substrate bias: - Voltage, V - Current, A |
0 - 300 5 |
| Number of gas supply channels | 2 - 3 |
| Power consumption, kW | 40 |
| Water flow at pressure of 4 - 6 atm -cold(5oC - 25oC), m3/h -hot (40oC - 60oC), m3/h |
4 3 |
| Compressed air pressure, bar | 4 - 6 |
| Occupied floor space, m2 | 16 |
| Weight, kg | 1500 |