High vacuum system intended for deposition of amorphous and crystalline
selenium and others coatings with thickness up to 1000 mcm on glass, metal and
ceramic substrates. The system has water-cooled stainless steel vacuum chamber
pumped with two cryo pumps. The resistive evaporator with subsequent vapor
distribution during transportation and rejection through the extended vertical
nozzle is used to evaporate materials.
SPECIFICATIONS
| Vacuum chamber dimensions, mm | Dia.800x950 |
| Ultimate vacuum, torr | 10-6 |
| Pumping time to ultimate vacuum, min | 25 |
| Substrates max. dimensions, mm | 470x370 |
| Number of substrate to be coated in one run | 5 |
| Deposition rate, mcm/min, up to | 12 |
| Coating non-uniformity, % | ±4 |
| Process control | Automatic |
| Power consumption, kW | 20 |
| Cooling water flow at pressure of 4 - 6 atm, m3/h | 1.2 |
| Compressed air pressure, bar | 4 - 6 |
| Occupied floor space, m2 | 16 |
| Weight, kg2 | 1000 |