TECHNOLOGICAL ION SOURCES
We supply a wide range of technological ion beam sources both linear and circular ones. Mainly these are the End Hall ion accelerators. Practically any gases, gaseous compounds and their mixes (argon, nitrogen, oxygen, hydrocarbons, chemically active gases) may be used as working gas for ion sources of this type.
In comparison with other types of known ion sources (Kauffmann ion sources, saddle-field ion sources, Penning discharge ion sources, ECR ion sources, RF ion sources and others), these ion sources have the following technological advantages:
- high ion beam current and current density;
- low ion energies;
- simple design and high reliability of ion sources and power supplies;
- long life.
The ion sources may be designed as ion sources with a cold cathode and as plasma sources with external emmitter of electrons. In the first case ion source produces an ion beam with relatively high (up to a few keV) ions energy and with relatively low ion current (below 1 mA/cm2). In the second case ion source generates the plasma beam with low ions energy (100 - 400 eV) but with high ion current dencities (up to 20 - 30 mA/cm2). The generated plasma is highly compensated what allows to sputter dielectrics with technologically high sputtering rates.
The main applications of these ion sources are as follows:
- ion beam surface cleaning;
- ion beam assisted coatings deposition;
- coatings deposition by ion beam sputtering;
- coating deposition from ion beam;
- ion beam milling;
- precise optical surfaces ion beam figuring;
- and a lot of others.....
These ion sources work fine together with magnetron sputtering systems and with arc evaporators providing both substrates pre-cleaning and reactive deposition of dielectric layers (oxides, nitrides, carbides) from metal targets with very good adhesion.
The linear ion sources with the length from approx. 100 to 2000 mm and circular ones with aperture diameter from 40 to 150 mm may be supplied together with power supplies and cas controllers (see Power Supplies and Controllers, Monitors pages). The ion beam sputtering modules (sputtering ion source, assisting ion source, and targets to be sputtered) and other kinds of ion sources are also available (Kauffmann, RF ion sources)
Please specify your needs and we'll offer the best ion source solution!
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| Linear ion source | Optimized linear ion source |
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| Ion beam sputtering system | Small ion sources | End Hall ion source with extended accelerating zone | AIDA ion source for IBAD | Glow discharge system |