![]() PSG/L-IS ![]() PSG/plc-IS |
These power supplies are intended to power ion sources, mainly End Hall ion
accelerators with anodic layer. The provide stabilized and controlled voltage,
current or power. Power supplies are produced with output power 3, 6 or 9 kW.
Applications: ion beam sputtering coatings deposition, ion beam cleaning, ion
etching, ion beam assisted coatings deposition. |
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Options: - cathode-compensator power supply up to 200 W. |
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SPECIFICATIONS
| Open-circuit voltage, V, no less than | 4000 |
| Output power, kW | 3/6/9 |
| Output parameters (voltage, current, power) non-stability, %, no more than | 1 |
| Output voltage ripple, %, no more than | 3 |
| Output parameters steady-time, s, no more | 1.5 |
| Arc or overload suppressing time, µs, no more than | 10 |
| Independent interlock inputs 0/24 V | 5 |
| Efficiency, no less than | 0.85< |
| Input power | 3 phases 50/60Hz, AC voltage on request |
| Overall dimensions, mm | 19", 4HU, 458x177x489 |