High vacuum system
for different (heat-resistant, wear-resistant,
erosion-resistant, decorative, etc.) multilayer coating deposition from high
energetic (10 - 1000 eV) and controlled plasma of material to be deposited.
Multicomponents non-magnetic alloys with any doping, pure metals, nitrides,
carbides, oxides, oxicarbonitrides may be evaporated and obtained. Film growth
from high energized particles provides deposition of sub fine-grain pore-free
coatings with adhesion close to material strength of the weakest part of
"substrate-coating" system. High (maximal possible) adhesion is the result of
surface cleaning and activation with the noble gases ions and coating material
plasma bombardment.
Automatic technological control provides coating composition
and thickness repeatability about 3%*. The load of material to be evaporated
guarantees 100 hours of continuous work with use factor no less than 15% - 20%.
Model VIAM-MESH-50 has no analogues and may be recommended for deposition of
multicomponents condensed, diffusive and condensation-diffusive protective
coatings onto turbine and compressor blades of aircraft, transport and energetic
power-plants, as well as hard and protective coatings on tools, cutters, and
details of machines.
Model VIAM-MESH-50 consists of high vacuum technological unit, control position
with IBM PC, control cabinet and four power cabinets. There is the rotating ring
carousel with vertically placed parts to be deposited in the vacuum chamber. The
plasma is generated by vacuum arc evaporators with cylindrical cathodes located
outside the carousel in the opening side doors. The ion source is located on the
front door used for parts loading/unloading.
SPECIFICATIONS
| Dimensions of workpiece, mm | 60(120)x400 |
| Number of carriers per carousel | 24(12) |
| Evaporation rate, g/h | up to 800 |
| Number of arc evaporators | 3 - 4 |
| Arc current, A | 300 - 2400 |
| Bias voltage, V | 0 - 800 |
| Bias current, A, max | 25 |
| Pirometric monitoring of parts heated by ion bombardment, oC | 100 - 800 |
| Ion source working voltage, V | 2000 - 3000 |
| Ion source max. current, A | 1 |
| Number of gas supply channels | 3 |
| Power consumption, kW | 150 |
| Overall dimensions, mm | 3500x4500x2200 |
| Weight, kg, no more | 6000 |