High vacuum system
for arc deposition of metals nitride, carbide, oxide,
carbonitride, and oxinitride coatings on metal, ceramic, glass, and heat
resistive plastics.
Intended for production of:
SPECIFICATIONS
| Vacuum chamber dimensions, mm | Dia.1000x1150 |
| Drum diameter, mm | 750 |
| Ultimate vacuum, torr | 10-6 |
| Pumping time to ultimate vacuum, min | 15 |
| Number of ion sources | 2 |
| Linear ion source: - Voltage, V - Current, A |
2000 2 |
| Number of arc evaporators with drop ohase separation | 2 |
| Arc evaporator: - Voltage, V - Current, A |
40 0 - 180 |
| Infrared substrates heater | 1 |
| Substrate bias: - Voltage, V - Current, A |
1200 30 |
| Number of gas supply channels | 2/3 |
| Power consumption, kW | 90 |
| Water flow at pressure of 4 - 6 atm -cold (+5oC - +25oC), m3/h -hot (+40oC - +60oC), m3/h |
5 0.5 |
| Compressed air pressure, bar | 2 - 3 |
| Occupied floor space, m2 | 16 |